Ion Source Technology

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Numerous standard or specially developed Ion Sources are available and can be operated at different accelerators to provide almost every type of ion species (pdf, 33 KB). Ongoing efforts to develop unusual beams (pdf, 19 KB) - especially from molecular ions (pdf, 104 KB) - are made to support various experiments with the storage ring.

Source	Pos	Neg	Type	CEx	used for ions	acc
Duoplasmatron Type EN	X	X	gas discharge	opt H₂, L	p, d, HD, He, HeH, ¹⁵N	1, 4, 6
Duoplasmatron Type MP	X	X	gas discharge	opt H₂, L	p, d, ^{3, 4}He, Li	1, 4
Off-Axis Duoplasmatron	-	X	gas discharge	-	H, D, O, F, Cl, S	1

Unis	-	X	Cs-Sputter	-	all except noble gases	1
Hiconex	-	X	Cs-Sputter	-	heavy ions (HI)	2
MISS-HD	-	X	Cs-Sputter	-	p, d, HI, molecules, clusters	1, 4, 5

Heinicke PIG	X	-	Penning Discharge	-	gas-ions, molecules	2, 4, 5
RF-Source SO 173	X	-	RF-Discharge	-	gas-ions, molecules	2, 4
SO-80-Magnetron-S.	X	-	Mini-ECR, 2, 4 GHz	-	p, d, He	2
Alphatross	X	X	RF-Discharge	Cs	p, d, H₂, D₂, H₃, HD	4§

CHORDIS	X	-	Multicusp/ Sputter	-	High Current Li, Be, Mg	4

ECR-11GHz	X	-	ECR-Plasma	-	Highly Charged Noble Gas	4
Hyper-Nanogun 18GHz	X	-	ECR-Plasma	-	Highly charged HI	4

RF22	X	-	Gas-discharge	-	cold molecules	4x
Laser-Source	X	-	Gas-discharge	-	cold molecules	4x
HOCIS-Source	X	-	cold plasma	-	cold Hollow Cathode	4x
Piezo-gas-source	X	-	pulsed high pressure gas	-	cold H₂ molecules	2x

Acc: 1: MP, 2 : 3MV-Pelletron, 3: Booster-Linac, 4 : HSI, 5 : CTF, 6 : external use (Flash, Cosmochemistry), 4x : supplied by user, 4§ : on loan from Weizmann Institute

Schematic view of the most widely used MISS-HD sputter source (pdf, 792 KB ; pdf, 262 KB) for negative ions, which has been developed in house following a basic design of R. Middleton.